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Utilizing the “KRYSTAL Wafer”—a silicon substrate with a Pt/ZrO₂ buffer layer provided by I-PEX Piezo Solutions Inc.—we have successfully grown high-quality thin films of the strongly correlated oxide LaNiO₃ on a silicon substrate and demonstrated a technology that reversibly controls thermal conductivity through electrical manipulation. This study demonstrates that the superior epitaxial growth environment provided by the KRYSTAL Wafer enables the realization of advanced functionalities in LaNiO₃, opening up new technological possibilities for the development of thermal control devices.
I-PEX Piezo Solutions Inc. received the Sputtering and Plasma Process Technology Committee Award 2024, which aims to award outstanding achievements that contribute to the development of sputtering and plasma process technology.

Our piezoelectric MEMS foundry service supports the development of high-performance piezoelectric MEMS devices using our superior single-crystal piezoelectric deposition and MEMS processing technologies.
We offer flexible services such as buffer wafer supply, and specific MEMS processing to meet your requirements.