Utilizing the “KRYSTAL Wafer”—a silicon substrate with a Pt/ZrO₂ buffer layer provided by I-PEX Piezo Solutions Inc.—we have successfully grown high-quality thin films of the strongly correlated oxide LaNiO₃ on a silicon substrate and demonstrated a technology that reversibly controls thermal conductivity through electrical manipulation. This study demonstrates that the superior epitaxial growth environment provided by the KRYSTAL Wafer enables the realization of advanced functionalities in LaNiO₃, opening up new technological possibilities for the development of thermal control devices.
I-PEX Piezo Solutions Inc. participated in the PiezoMEMS2025 workshop, which is held in Himeji, Japan, from November 4 (Tuesday) and 5 (Wednesday), 2025.
I-PEX Piezo Solutions Inc. received the Sputtering and Plasma Process Technology Committee Award 2024, which aims to award outstanding achievements that contribute to the development of sputtering and plasma process technology.
I-PEX Piezo Solutions Inc. is exhibiting at the MEMS Sensing & Network Systems Expo 2025 being held at Tokyo Big Sight from January 29 (Wed.) to 31 (Fri.), 2025.
